Development of Porous SiLKTM Semiconductor Dielectric Resin for the 65 nm and 45 nm Nodes
- Author(s):
- Publication title:
- Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics-2003 : symposium held April 21-25, 2003, San Francisco, California, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 766
- Pub. Year:
- 2003
- Page(from):
- 265
- Page(to):
- 272
- Pages:
- 8
- Pub. info.:
- Warrendale, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558997035 [1558997032]
- Language:
- English
- Call no.:
- M23500/766
- Type:
- Conference Proceedings
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