Effect of Al-Content and Post Deposition Annealing on the Electrical Properties of Ultra-Thin HfAlxOy Layers | 東京工業大学附属図書館文献データベース

Blank Cover Image

Effect of Al-Content and Post Deposition Annealing on the Electrical Properties of Ultra-Thin HfAlxOy Layers

Author(s):

Publication title:

Novel materials and processes for advances CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

745

Pub. Year:

2003

Page(from):

35

Page(to):

40

Pages:

6

Pub. info.:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558996823 [1558996826]

Language:

English

Call no.:

M23500/745

Type:

Conference Proceedings

Details

TDL ID:	ZA00014405
Series ID:	PA00000011
Conf. info. (Name):	Symposium on novel materials and processes for advances CMOS
Conf. info. (Number):	2002
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	2002.12.02-2002.12.04

Similar Items:

1 Conference Proceedings Thermal Stability of High-k Layers Zhao, C., Cosnier, V., Chen, P.J., Richard, O., Roebben, G., Maes, J., Elshocht, S.Van, Bender, H., Young, E., Biest, … Materials Research Society	7 Conference Proceedings Application of X-Ray Fluorescence Spectrometry in Characterization of High-k Ultra-Thin Films Zhao, C., Brijs, B., Dortu, F., DeGendt, S., Caymax, M., Heyns, M., Besling, W., Maes, J.W. SPIE-The International Society for Optical Engineering
2 Conference Proceedings ALD HfO2 Surface Preparation Study Delabie, Annelies, Caymax, M., Maes, J.W., Bajolet, P., Brijs, B., Cartier, E., Conard, T., Gendt, S.De, Richard, O., … Materials Research Society	8 Conference Proceedings Application of X-Ray Fluorescence Spectrometry in Characterization of High-k Ultra-Thin Films Zhao, C., Bijjs, B., Dortu, F., DeGendt, S., Caymax, M, Heyns, M, Besling, W, Maes, J.W. Electrochemical Society
3 Conference Proceedings High-k Materials for Advanced Gate Stack Dielectrics: A Comparison of ALCVD and MOCVD as Deposition Technologies Caymax, Matty, Bender, H., Brijs, B., Conard, T., Gendt, S. De, Delabie, A., Heyns, M., Onsia, B., Ragnarsson, L., … Materials Research Society	9 Conference Proceedings Compatibility of Polysilicon with HfO2-based Gate Dielectrics for CMOS Applications Kaushik, V., De Gendt, S., Caymax, M., Young, E., Rohr, E., Van Elshocht, S., Delabie, A., Claes, M., Shi, X., Chen, I., … Electrochemical Society
4 Conference Proceedings INTEGRATION ISSUES OF POLYSILICON WITH HIGH K DIELECTRICS DEPOSITED BY ATOMIC LAYER CHEMICAL VAPOR DEPOSITION Tsai, W., Chen, I., Carter, R., Cartier, E., Kluth, J., Richard, O., Claes, M., Lin, Y.M., Nohira, H., Conard, T., … Electrochemical Society	10 Conference Proceedings The Influence of Defects on Compatibility and Yield of the HfO2-PolySilicon Gate Stack for CMOS Integration Kaushik, V. S., DeGendt, S., Carter, R., Claes, M., Rohr, E., Pantisano, L., Kluth, J., Kerber, A., Cosnier, V., … Materials Research Society
5 Conference Proceedings INTEGRATION ISSUES OF POLYSILICON WITH HIGH K DIELECTRICS DEPOSITED BY ATOMIC LAYER CHEMICAL VAPOR DEPOSITION Tsai, W., Chen, I., Carter, R., Cartier, E., Kluth, J., Richard, O., Claes, M., Lin, Y.M., Nohira, H., Conard, T., … Electrochemical Society	11 Conference Proceedings Characterization of Nano-Laminate Structure Using Grazing Incidence XRD and ATR-FTIR Zhao, C., DeGendt, S., Caymax, M, Heyns, M, Consier, V., Maes, J.W, Roebben, G., Van Der Blest, O. Electrochemical Society
6 Conference Proceedings The Influence of Defects on Compatibility and Yield of the HfO2-PolySilicon Gate Stack for CMOS Integration Kaushik, V.S., Gendt, S.De, Carter, R., Claes, M., Rohr, E., Pantisano, L., Kluth, J., Kerber, A., Cosnier, V., Cartier, … Materials Research Society	12 Conference Proceedings Characterization of Nano-Laminate Structure Using Grazing Incidence XRD and ATR-FTIR Zhao, C., DeGendt, S., Caymax, M., Heyns, M., Consier, V., Maes, J.W., Roebben, G., Van Der Biest, O. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12