Growth of CVD Thin Films and Thick LPE 3C SiC in a Specially Designed Reactor

Growth of CVD Thin Films and Thick LPE 3C SiC in a Specially Designed Reactor

Author(s):: Leycuras, A.
Publication title:: Silicon carbide and related materials - 1999 : ICSCRM'99, proceedings of the International Conference on Silicon Carbide and Related Materials - 1999, Research Triangle Park, North Carolina, USA, October 10-15, 1999
Title of ser.:: Materials science forum
Ser. no.:: 338-342(1)
Pub. Year:: 2000
Page(from):: 241
Page(to):: 244
Pages:: 4
Pub. info.:: Zuerich, Switzerland: Trans Tech Publications
ISSN:: 02555476
ISBN:: 9780878498543 [0878498540]
Language:: English
Call no.:: M23650
Type:: Conference Proceedings

Details

TDL ID:	ZA00014226
Series ID:	PA00000012
Conf. info. (Name):	International Conference on Silicon Carbide and Related Materials : ICSCRM
Conf. info. (Number):	1999
Conf. info. (Venue):	Research Triangle Park, North Carolina, USA
Conf. info. (Date):	1999.10.10-1999.10.15

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