Blank Cover Image

High Density Plasma Silicon Carbide As A Barrier/Etch Stop Film For Copper Damascene Interconnects

Author(s):
Publication title:
Materials, technology and reliability for advanced interconnects and low-k dielectrics : symposium held April 23-27, 2000, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
612
Pub. Year:
2001
Page(from):
D9.14
Pub. info.:
Warrendale, PA: Materials Research Society
ISSN:
02729172
ISBN:
9781558995208 [155899520X]
Language:
English
Call no.:
M23500/612
Type:
Conference Proceedings

Similar Items:

Cho, S.-M., Zhang, L., M'saad, H., Zhuang, L.

Electrochemical Society

Li, X., Gay, D.L., McNeill, D.W., Armstrong, B.M., Gamble, H.S.

Electrochemical Society

Lee, Albert S., Lakshmanan, Annamalai, Rajagopalan, Nagarajan, Cui, Zhenjiang, Le, Maggie, Xia, Li Qun, Kim, Bok Heon, …

Materials Research Society

Levert, J., Mukherjee, S., DeBear, D., Fury, M.

Electrochemical Society

M'saad, H., Vellaikal, M., Zhang, L., Witty, D.

MRS - Materials Research Society

Dubin, V. M., Lopatin, S., Chen, S., Cheung, R., Ryu, C., Wong, S. S.

MRS - Materials Research Society

Ho,P.K.K., Zhou,M.-S., Gupta,S., Chockalingam,R., Li,J.-X., Fan,M.-H.

SPIE - The International Society for Optical Engineering

Yang, M., Ambrose, T.

Electrochemical Society

Lee, Albert, Rajagopalan, Nagarajan, Le, Maggie, Kim, Bok Heon, M’Saad, Hichem

Materials Research Society

Lee, A.S., Le, N.Rajagopalan.M., Kim, B.K., Saad, H.M.

Electrochemical Society

Yang, M., Gang, Y., Ambrose, Tom

Electrochemical Society

G. C. Smith, R. McGowan, S. Hosali, L. Smith, K. Pfeifer

Electrochemical Society

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12