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Processing and Characterization of Silica Xerogel Films for Low-K Dielectric Applications

Author(s):
Gill, W. N.
Jain, A.
Nitta, S. V.
Oehrlein, G. S.
Pisupattt, V.
Plawsky, J. L.
Rogojevic, S.
Staert, T. E. F. M.
Wayner, P. C.
4 more
Publication title:
Low-dielectric constant materials V : symposium held April 5-8, 1999, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
565
Pub. Year:
1999
Page(from):
29
Page(to):
40
Pages:
12
Pub. info.:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558994720 [1558994726]
Language:
English
Call no.:
M23500/565
Type:
Conference Proceedings

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