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Fullerene Derivatives as Novel Resist Materials for Fabrication of MEMS Devices by Electron Beam Lithography

Author(s):
Robinson, A.P.G
Palmer, R.E.
Preece, J.A.
Shelley, E.J.
Kanayama, T.
Tada, T.
1 more
Publication title:
Materials science of microelectromechanical systems (MEMS) devices : symposium held December 1-2, 1998, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
546
Pub. Year:
1999
Page(from):
219
Page(to):
224
Pages:
6
Pub. info.:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558994522 [1558994521]
Language:
English
Call no.:
M23500/546
Type:
Conference Proceedings

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