Ota, Masahiro, Nishimoto, Hirayuki, Endou, Hajime
American Institute of Chemical Engineers
|
Tajima, H., Yamasaki, A., Kiyono, F.
Elsevier
|
N. Cao, M. Ota, K. Murakami, H. Endou
American Institute of Aeronautics and Astronautics
|
Chen, C.-F., Hong, T.-M., Chen, M.L.
Electrochemical Society
|
Sachiko Hayashi, Akihiro Yamasaki, Yukio Yanagisawa
American Institute of Chemical Engineers
|
Adachi, M., Okuyama, K., Tohge, N.
Electrochemical Society
|
Shiojiri, K., Okano, T., Yanagisawa, Y., Fujii, M., Yamasaki, A., Tajima, H., Kiyono, F.
Elsevier
|
Jeffrey Culp, Fan Shi, Christopher Matranga
American Institute of Chemical Engineers
|
Guochang Zhang, Rudy E. Rogers, Ni Liu, Shangmin Xiong, William T. French
American Institute of Chemical Engineers
|
Amadeu K. Sum, Yue Hu, Bo Ram Lee
American Institute of Chemical Engineers
|
KING, M. L., FORMAN, A. L., ORELLA, C., PINES, S. H.
American Institute of Chemical Engineers
|
Amadeu K. Sum, Yue Hu, Bo Ram Lee
American Institute of Chemical Engineers
|