Blank Cover Image

a-Si:H TFTs with a Graded Gate SiNx Dielectric Structure - Interfacial Layer Thickness Effects and Characterization

Author(s):
Publication title:
Proceedings of the Second Symposium on Thin Film Transistor Technologies
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
1994-35
Pub. Year:
1994
Page(from):
41
Page(to):
51
Pages:
11
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770941 [1566770947]
Language:
English
Call no.:
E23400/950720
Type:
Conference Proceedings

Similar Items:

Libsch,F.R., Tsujimura,T.

SPIE-The International Society for Optical Engineering

Kuo, Y., Paloura, E. C., Dzioblkowski, C.

Electrochemical Society

Yue Kuo, Mary Coan

Materials Research Society

Kuo, Y.

MRS - Materials Research Society

Fryer, Peter M., Colgan, E., Galligan, E., Graham, W., Horton, R., Jenkins, L., John, R., Kuo, Y., Latzko, K., Libsch, …

MRS - Materials Research Society

Yue Kuo, Helinda Nominanda

Materials Research Society

Fryer, Peter M., Colgan, E., Galligan, E., Graham, W., Horton, R., Jenkins, L., John, R., Kuo, Y., Latzko, K., Libsch, …

MRS - Materials Research Society

Ma, F., Wagner, S.

Electrochemical Society

Singh, R., Fakhruddin, M., Poole, K.F., Kondapi, S.V., Gupta, A., Narayan, J., Kar, S.

Electrochemical Society

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12