Rutooj D. Deshpande, Yang -Tse Cheng, Mark W. Verbrugge
American Institute of Chemical Engineers
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Li, Q., Zhao, N., Wei, W., Sun, Y.
Elsevier
|
Verbrugge, Mark W., Gu, Hiram
Electrochemical Society
|
Rendek, L.J., Jr., Chottiner, G.S., Scherson, D.A.
Electrochemical Society
|
Justin Purewal, John Wang, Jason Graetz, Harshad Tataria, Mark W. Verbrugge
American Institute of Chemical Engineers
|
Park, D. -W., Hur, J. -H., Jeong, E. -S., Park, S. -W., Kim, I.
Elsevier
|
Justin Purewal, John Wang, Jason Graetz, Harshad Tataria, Mark W. Verbrugge
American Institute of Chemical Engineers
|
K. Hayamizu, M. Hattori, J. Arai, A. Matsuo
Electrochemical Society
|
Rutooj D. Deshpande, Yang-Tse Cheng, Mark W. Verbrugge, Adam Timmons
American Institute of Chemical Engineers
|
Wei, W., Wei, T., Sun, Y.
American Chemical Society
|
Bernardi, Dawn M., Verbrugge, Mark W.
American Institute of Chemical Engineers
|
Pernkopf, W., Sagl, M., Fafilek, G., Linhardt, P., Besenhard, J.O., Kronberger, H., Nauer, G.F.
Electrochemical Society
|