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Sub-Half-Micron Aluminum Stack Film Etching on MERIE Plasma Reactor

Author(s):
Publication title:
Proceedings of the tenth symposium on plasma processing
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
1994-20
Pub. Year:
1994
Page(from):
380
Page(to):
388
Pages:
9
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770774 [1566770777]
Language:
English
Call no.:
E23400/941901
Type:
Conference Proceedings

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