Inductively Coupled Plasma Source for Reactive Ion Etching

Inductively Coupled Plasma Source for Reactive Ion Etching

Author(s):

Publication title:

Proceedings of the tenth symposium on plasma processing

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

1994-20

Pub. Year:

1994

Page(from):

368

Page(to):

379

Pages:

12

Pub. info.:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566770774 [1566770777]

Language:

English

Call no.:

E23400/941901

Type:

Conference Proceedings

Details

TDL ID:	ZA00014129
Series ID:	PA00000028
Conf. info. (Name):	International Symposium on Plasma Processing ; Meeting of the Electrochemical Society
Conf. info. (Number):	10th ; 185th
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	1994.05.22-1994.05.27

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