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Kinetics Of TEOS Surface Reactions On Si02 Between 765 K And 1200 K Studied With FTIR

Author(s):
Publication title:
Proceedings of the third Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
1994-16
Pub. Year:
1994
Page(from):
539
Page(to):
548
Pages:
10
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770484 [1566770483]
Language:
English
Call no.:
E23400/942240
Type:
Conference Proceedings

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