Deposition Parameter Studies Of Silicon Nitride Films Prepared By PECVD Process And Their Applications To Surface Acoustic Wave Devices

Deposition Parameter Studies Of Silicon Nitride Films Prepared By PECVD Process And Their Applications To Surface Acoustic Wave Devices

Author(s):

Publication title:

Proceedings of the third Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

1994-16

Pub. Year:

1994

Page(from):

198

Page(to):

207

Pages:

10

Pub. info.:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566770484 [1566770483]

Language:

English

Call no.:

E23400/942240

Type:

Conference Proceedings

Details

TDL ID:	ZA00014125
Series ID:	PA00000028
Conf. info. (Name):	Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films
Conf. info. (Number):	3rd
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	1994.05.23-1994.05.27

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