TXRF REFERENCE STANDARDS: A DISCUSSION

TXRF REFERENCE STANDARDS: A DISCUSSION

Author(s):: Hockett, R.S.
Publication title:: Proceedings of the Symposium on Contamination Control and Defect Reduction in Semiconductor Manufacturing III
Title of ser.:: Electrochemical Society Proceedings Series
Ser. no.:: 1994-9
Pub. Year:: 1994
Page(from):: 323
Page(to):: 338
Pages:: 16
Pub. info.:: Pennington, NJ: Electrochemical Society
ISSN:: 01616374
ISBN:: 9781566770415 [1566770416]
Language:: English
Call no.:: E23400/941386
Type:: Conference Proceedings

Details

TDL ID:	ZA00014118
Series ID:	PA00000028
Conf. info. (Name):	Symposium on Contamination Control and Defect Reduction in Semiconductor Manufacturing
Conf. info. (Number):	3rd
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	1994.05.23-1994.05.27

Similar Items:

1 Conference Proceedings TXRF CHARACTERIZATION OF TRACE METAL CONTAMINATION IN THIN GATE OXIDES . Hockett, R.S., Hymes, Diane Materials Research Society	7 Conference Proceedings SURFACE SIMS ROUND ROBIN FOR NA, AL AND K ON SILICON WAFERS Hockett, R.S., Diebold, Alain Electrochemical Society
2 Conference Proceedings CHARACTERIZATION OF HEAVY METAL CONTAMINATION IN DIAMOND FILMS USING MIMS, TXRF, AND RBS Hockett, R.S., Knowles, James Materials Research Society	8 Conference Proceedings SIMS Study of C, O and N Impurity Contamination for Multi-Crystalline Si Solar Cells Larry Wang, R.S. Hockett Materials Research Society
3 Conference Proceedings TOTAL REFLECTION X-RAY FLUORESCENCE (TXRF) Hockett, R. S. MRS - Materials Research Society	9 Conference Proceedings INVESTIGATIONS OF RESIDUAL CHLORINE ON ETCHED AlCu METAL LINES BY TOTAL REFLECTION X-RAY FLUORESCENCE (TXRF) Hockett, R. S., Herman, M. H., Mu, X. C., Ma, Li-Jia Materials Research Society
4 Conference Proceedings Submicron, Noble Metal Particle Reference Standards: A Proposal Hockett, R. S., Craig, Angela Y., Le, Diem MRS - Materials Research Society	10 Conference Proceedings The Measurement of Nitrogen in Silicon Substrates by SIMS Hockett, R.S., Sams, D.B. Electrochemical Society
5 Conference Proceedings ION IMPLANTED CALIBRATION STANDARDS FOR Si SURFACE CONTAMINATION DETECTION BY TXRF Jacobson, D. C., Poate, J. M., Higashi, G. S., Boone, T., Eaglesham, D. J., Hockett, Richard MRS - Materials Research Society	11 Conference Proceedings SIMS measurements of metal contamination in SOI Hong Yang, M., Wang, A., Neuburger, M., Hockett, R.S. Electrochemical Society
6 Conference Proceedings HIGH SENSITIVITY SURFACE ANALYSIS OF SILICON WAFERS BY TIME-OF FLIGHT SECONDARY ION MASS SPECTROMETRY (TOF-SIMS) Schueler, B., Hockett, R.S. Electrochemical Society	12 Conference Proceedings The Measurement of Nitrogen in Silicon Substrates by SIMS Hockett,R.S., Sams,D.B. Electrochemical Society, SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12