METAL CONTAMINATION AND SILICON DAMAGE EFFECTS OF OXIDE PLASMA ETCH PROCESSES

METAL CONTAMINATION AND SILICON DAMAGE EFFECTS OF OXIDE PLASMA ETCH PROCESSES

Author(s):

Vincs, L.

Publication title:

Proceedings of the Symposium on Contamination Control and Defect Reduction in Semiconductor Manufacturing III

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

1994-9

Pub. Year:

1994

Page(from):

141

Page(to):

153

Pages:

13

Pub. info.:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566770415 [1566770416]

Language:

English

Call no.:

E23400/941386

Type:

Conference Proceedings

Details

TDL ID:	ZA00014118
Series ID:	PA00000028
Conf. info. (Name):	Symposium on Contamination Control and Defect Reduction in Semiconductor Manufacturing
Conf. info. (Number):	3rd
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	1994.05.23-1994.05.27

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