THE USE OF CHEMICAL SENSORS AND PROCESS CONTROL METHODS TO IMPROVE HF CHEMICAL ETCHING OF SILICA

THE USE OF CHEMICAL SENSORS AND PROCESS CONTROL METHODS TO IMPROVE HF CHEMICAL ETCHING OF SILICA

Author(s):

Publication title:

Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

1994-7

Pub. Year:

1994

Page(from):

537

Page(to):

545

Pages:

9

Pub. info.:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566770385 [1566770386]

Language:

English

Call no.:

E23400/941397

Type:

Conference Proceedings

Details

TDL ID:	ZA00014117
Series ID:	PA00000028
Conf. info. (Name):	International Symposium on Cleaning Technology in Semiconductor Device Manufacturing ; Electrochemical Society Fall Meeting
Conf. info. (Number):	3rd ; 1993
Conf. info. (Venue):	New Orleans, Louisiana, USA
Conf. info. (Date):	1993.10.15-1993.10.20

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