Blank Cover Image

Effect of Light Irradiation on Metal Adherence to Si Wafer Surface in Dilute HF Solution

Author(s):
Publication title:
Proceedings of the Symposium on Contamination Control and Defect Reduction in Semiconductor Manufacturing II
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
1994-3
Pub. Year:
1994
Page(from):
191
Page(to):
194
Pages:
4
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770651 [1566770653]
Language:
English
Call no.:
E23400/941395
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Surface Structure of Hydrogen Annealed Silicon Wafer Using Ozonized Water and Dilute HF Cleaning

Kurita, H., Izunome, K., Nagahama, H., Ino, T., Yamabe, J., Hayamizu, N., Sakurai, N.

Electrochemical Society
7 Conference Proceedings REMOVAL OF Cu FROM Si WAFER SURFACES USING DILUTE HF-HC1 SOLUTIONS

Dhanda, S., Chiarello, R.P., Helms, C.R., Gupta, P.

Electrochemical Society
2 Conference Proceedings SURFACE ANALYSIS OF Si(100) WAFERS PROCESSED IN VANADIUM SPIKED DILUTE HF SOLUTIONS

Prasad, Jagdish, Sees, Jennifer, Lester, Lisa, Douglas, Monte, Templeton, Allen, Hall, Lindsey

Electrochemical Society
8 Conference Proceedings MECHANISTIC STUDY OF THE DEPOSITION OF METALS FROM HF SOLUTIONS ONTO SILICON WAFERS

Parks, H. G., Hiskey, J. B., Yoneshige, K.

MRS - Materials Research Society
3 Conference Proceedings EFFECT OF H2O2 AND IPA ADDITION IN DILUTE HF SOLUTION ON SURFACE ETCHING AND PARTICLE REMOVAL EFFICIENCY

Eom, D.-H., Lee, S.-H., Kim, K.-S., Lee, C.-H., Park, J.-G.

Electrochemical Society
9 Conference Proceedings Characterization of the direct Bonding of Silicon Wafers after Treatment in Dilute HF Solutions

Okada, C., Kawai, Y., Morita, E., Saitou, Y.

Electrochemical Society
4 Conference Proceedings Study of Near-Surface Microdefects in Czochralski-Si Wafers after a CMOS Thermal Process

Kitagawara,Y., Aihara,K., Oka,S., Takenaka,T.

Trans Tech Publications
10 Conference Proceedings PARTICLE REMOVAL EFFICIENCY OF DILUTED HF SOLUTIONS

Alessandri, M., Bellandi, E., Pipia, F., Crivelli, B., Wolke, K., Schenkl, M.

Electrochemical Society
5 Conference Proceedings THE EFFECT OF SURFACTANTS IN DILUTE HF SOLUTIONS

Leahman, M., Simmons, M., Jackson, M., Spivey, C., Hong, B., Mori, E.J.

Electrochemical Society
11 Conference Proceedings AN EVAULATION OF METALLIC IMPURITY CLUSTER ON SILICON WAFER SURFACE BY SC I REPEAT CLEANING

Mizuno, M., Fukami, T., Takenaka, T.

Electrochemical Society
6 Conference Proceedings Evaluation of near-surface microdefects in Czochralski-Si wafers after a CMOS process by an infrared interference method

Kitagawara,Y., Aihara,K., Oka,S., Takenaka,T.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings EFFECT OF SURFACTANTS ON PARTICLE CONTAMINATION OF SILICON SURFACE IN HF SOLUTIONS

Vehmas, T., Ritala, H., Arittila, O.

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12