Real Time Monitoring of Silicon Surface Cleaning Using H2 and NH3 Plasmas

Real Time Monitoring of Silicon Surface Cleaning Using H2 and NH3 Plasmas

Author(s):

Publication title:

Proceedings of the Symposium on Highly Selective Dry Etching and Damage Control

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

1993-21

Pub. Year:

1993

Page(from):

35

Page(to):

46

Pages:

12

Pub. info.:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566770668 [1566770661]

Language:

English

Call no.:

E23400/932473

Type:

Conference Proceedings

Details

TDL ID:	ZA00014110
Series ID:	PA00000028
Conf. info. (Name):	Symposium on Highly Selective Dry Etching and Damage Control
Conf. info. (Number):	1993
Conf. info. (Venue):	Honolulu, HI, USA
Conf. info. (Date):	1993.05.19-1993.05.21

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