Blank Cover Image

SURFACE DAMAGE CAUSED BY METAL ETCH PROCESSES AS MEASURED BY ATOMIC FORCE MICROSCOPY

Author(s):
Publication title:
Proceedings of the Third International Symposium on Process Physics and Modeling in Semiconductor Technology
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
1993-6
Pub. Year:
1993
Page(from):
443
Page(to):
456
Pages:
14
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770644 [1566770645]
Language:
English
Call no.:
E23400/930578
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Tungsten Plug Etchback in a TCP Etcher

Allen, L.R.

Electrochemical Society

Battersby,C.L., Sheehan,L.M., Kozlowski,M.R.

SPIE - The International Society for Optical Engineering

J.-S. Maa, L.R. Allen, D. Evans, T.-Y. Hsieh, B.D. Ulrich

Society of Photo-optical Instrumentation Engineers

Blach, J.A., Watson, G.S., Brown, C.L., Pham, D.K., Wright, J.P., Nicolau, D.V., Myhra, S.

SPIE-The International Society for Optical Engineering

Allen, L.R.

Electrochemical Society

Gilicinski, Andrew G., Rynders, Rebecca M., Beck, Scott E., Strausser, Yale E., Stets, James R., Felker, Brian S., …

MRS - Materials Research Society

Hamilton, J. D., Papantonakis, M. R., Haglund, R. F., Jr., Godbole, M., Lowndes, D. H.

MRS - Materials Research Society

Vanlandingham, M. R., McKnight, S. H., Palmese, G. R., Eduljee, R. F., Gillespie, J. W., Jr., McCullough, R. L.

MRS - Materials Research Society

Lanzerotti, M. Y. D., Meisel, L. V., Johnson, M. A., Wolfe, A., Thomson, D. J.

MRS - Materials Research Society

Farooqui, M.M., Evans, A.G.R.

Materials Research Society

Ogletree F. D., Hu J., Xiao D. X., Morant C., Dai Q., Vollmer R., Carpick R., Salmeron M.

Kluwer Academic Publishers

Kemnitzer, R., Koch, Th., Kuppers, J., Lux-Steiner, M., Schimmel, Th.

Kluwer Academic Publishers

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12