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MODELING OF THE SILANE SURFACE REACTION INT THE CHEMICAL VAPOR DEPOSITION OF POLYSILICON IN A COLD WALL RAPID THERMAL SYSTEM

Author(s):
Publication title:
Proceedings of the Third International Symposium on Process Physics and Modeling in Semiconductor Technology
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
1993-6
Pub. Year:
1993
Page(from):
337
Page(to):
349
Pages:
13
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770644 [1566770645]
Language:
English
Call no.:
E23400/930578
Type:
Conference Proceedings

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