Blank Cover Image

A Kinetic Study of CVD-WSix Processes. The Comparison of WF6/SiH4 and WF6/Si2H6 Processes

Author(s):
Saito, T.
Oshima, K.
Egashira, Y.
Shimogaki, Y.
Komiyama, H.
Sugarwara, K.
1 more
Publication title:
Proceedings of the Twelfth International Symposium on Chemical Vapor Deposition
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
1993-2
Pub. Year:
1993
Page(from):
238
Page(to):
243
Pages:
6
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770743 [1566770742]
Language:
English
Call no.:
E23400/930161
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Theoretical Reactor Design from the Simple Tubular Reactor Analysis for WSix CVD Process

Chae, Y. K., Egashira, Y., Shimogaki, Y., Sugawara, K., Komiyama, H.

MRS - Materials Research Society
7 Conference Proceedings Elementary Reaction Simulation of Al-CVD Using Dimethyl Aluminum Hydride

Sugiyama, M., Nakajima, T., Tanaka, T., Itoh, H., Aoyama, J., Egashira, Y., Yamashita, K., Komiyama, H., Shimogaki, Y.

Electrochemical Society
2 Conference Proceedings Computer Simulation of Wsix CVD VLSI Processing Effect of Abnormal Inlet Gas Flows

Sugawara, K., Muranushi, T., Takai, T., Shimogaki, Y.K.Clae.Y., Komiyama, H., Egashira, Y.

Electrochemical Society
8 Conference Proceedings Theoretical Optimization of Al-CVD using Elementary Reaction Simulation

Sugiyama, M., Iino, T., Nakajima, T., Tanaka, T., Itoh, H., Aoyama, J., Egashira, Y., Yamashita, K., Komiyama, H., …

Electrochemical Society
3 Conference Proceedings Computer-Aided Reaction Design (CARD) to Investigate the Control of SIH4/O2 CVD by Gas-Phase Additives

Takahashi, T., Hagiwara, K., Egashira, Y., Komiyama, H.

Electrochemical Society
9 Conference Proceedings Reaction Analysis For Tetraethoxysilane And Ozone Atmospheric Pressure Chemical Vapor Deposition Doped Oxides

Fujino, K., Egashira, Y., Shimogaki, Y., Komiyama, H.

Electrochemical Society
4 Conference Proceedings Effect of the Carrier Gases on the CVD of Tungsten from WF6-SiH4

Rhee, S.-W., Choi, H.-S., Park, S.-K., Shimogaki, Y., Komiyama, H.

Electrochemical Society
10 Conference Proceedings The Best Way to Obtain Good Quality CVD-TiN Films From TiCl4 and NH3

Hamamura, Hirotaka, Shimogaki, Yukihiro, Akiyama, Yasunobu, Egashira, Yasuyuki, Komiyama, Hiroshi

MRS - Materials Research Society
5 Conference Proceedings Step Coverage Simulation for TEOS/03 Atmospheric Pressure CVD

Fujino, K., Egashira, Y., Shimogaki, Y., Komiyama, H.

Electrochemical Society
11 Conference Proceedings A Design Policy of the SiC CVD Reactor Based on the Chemical Reaction Kinetics of Dichlodimethylsilane

Takeuchi, T., Egashira, Y., Komiyama, H.

Electrochemical Society
6 Conference Proceedings How to Model CVD Processes - Present Understanding of CVD Mechanism

Egashira, Y., Shimogaki, Y., Komiyama, H., Akiyama, Y., Sato, T., Imaishi, N., Sato, Y., Matui, I., Ohmine, T.

Electrochemical Society
12 Conference Proceedings Gas Phase and Surface Reactions in C2F4 Glow Discharge Polymerization

Loh, E.G., Shimogaki, Y., Komiyama, H.

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12