Recent Progress in Gate Dielectric Scaling
- Author(s):
Higashi, G. Kraus, P. Chua, T.C. Olsen, C. Ahmed, K. Nouri, F. Kher, S.S. Sharangpani, R. Deaton, P. Ulloa, E.J. Tevatia, G. Narwankar, P.K. - Publication title:
- Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 2004-01
- Pub. Year:
- 2004
- Page(from):
- 271
- Page(to):
- 277
- Pages:
- 7
- Pub. info.:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566774062 [1566774063]
- Language:
- English
- Call no.:
- E23400/200401
- Type:
- Conference Proceedings
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