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52. Atomic Layer Deposition of high-k metal oxides for gate and capacitor dielectrics

Author(s):
Senzaki, Y.
Pork, S. G.
Iliguchi, R.
Chotliom, H.
Bortholomew, L.
Al-Lomi, S.
Borelli, C.
Lee, S-I.
Helms, A., Jr.
4 more
Publication title:
Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2003-14
Pub. Year:
2003
Page(from):
423
Page(to):
428
Pages:
6
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773966 [1566773962]
Language:
English
Call no.:
E23400/200314
Type:
Conference Proceedings

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