47 Selective oxidation of tungsten gate stacks in high-volume DRAM production
- Author(s):
Roters, G. Hayn, R. Kegel, W. Storbeck, O. Frigge, S. Feldmeyer, G. Meyer, H.J. Schroer, E. - Publication title:
- Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 2003-14
- Pub. Year:
- 2003
- Page(from):
- 385
- Page(to):
- 390
- Pub. info.:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566773966 [1566773962]
- Language:
- English
- Call no.:
- E23400/200314
- Type:
- Conference Proceedings
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