34 Rapid thermal annealing of atomic layer deposited hafnium-silicate/poly-silicon layers
- Author(s):
Rittersma, Z.M. Massoubre, D. Roozeboorn, F. Verheijen, M.A. van Berkum, J.G.M Tamminga, Y. Dao, F. Snijders, J.H.M Vainonen-Ahigren, E. Fois, F. Tuominen, M. Haukka, S. - Publication title:
- Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 2003-14
- Pub. Year:
- 2003
- Page(from):
- 273
- Page(to):
- 280
- Pages:
- 8
- Pub. info.:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566773966 [1566773962]
- Language:
- English
- Call no.:
- E23400/200314
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
39 Characterization of Laminated CeO2-HfO2 High-k Gate Dielectrics Deposited by Pulsed Laser Deposition
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
Materials Research Society |
9
Conference Proceedings
Modeling and Engineering of Hafnium Silicate (HfSiO) Gate Dielectrics Deposited by Nano-Laminated Atomic-Layer Deposition (NL-ALD)
Electrochemical Society |
Electrochemical Society |
10
Conference Proceedings
INTEGRATION ISSUES OF POLYSILICON WITH HIGH K DIELECTRICS DEPOSITED BY ATOMIC LAYER CHEMICAL VAPOR DEPOSITION
Electrochemical Society |
Electrochemical Society |
11
Conference Proceedings
INTEGRATION ISSUES OF POLYSILICON WITH HIGH K DIELECTRICS DEPOSITED BY ATOMIC LAYER CHEMICAL VAPOR DEPOSITION
Electrochemical Society |
6
Conference Proceedings
A Novel Atomic Layer Deposition Process to Deposit Hafnium Silicate Thin Films
Electrochemical Society |
Electrochemical Society |