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Effect of Abrasive Particles on Chemical Mechanical Polishing Performance

Author(s):
Tamboli, D.
Banerjee, G.
Chang, S.
Waddell, M.
Butcher, I.
Arefeen, Q.
Hymes, S.
2 more
Publication title:
Thin film materials, processes, and reliability, plasma processing for the 100 nm node and copper interconnects with low-k inter-level dielectric films : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2003-13
Pub. Year:
2003
Page(from):
291
Page(to):
303
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773935 [1566773938]
Language:
English
Call no.:
E23400/200313
Type:
Conference Proceedings

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