Selective Silicon Nitride Etching by ECR Plasmas Using SF6 and NF3 Based Gas Mixtures
- Author(s):
- Publication title:
- Microelectronics technology and devices : SBMICRO 2003 : proceedings of the eighteenth international symposium
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 2003-9
- Pub. Year:
- 2003
- Page(from):
- 292
- Page(to):
- 301
- Pages:
- 10
- Pub. info.:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566773898 [156677389X]
- Language:
- English
- Call no.:
- E23400/200309
- Type:
- Conference Proceedings
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