Blank Cover Image

Fabrication Characteristics of Midgap Metal Gates Compatible With Thin SiO2 Films Using Low Pressure Chemically Vapor Deposited Tungsten Films

Author(s):
Kouvatsos, D.N.
Ioannou-Sougleridis, V.
Tsevas, S.
Davazoglou, D.
Christoforou, F.
Boukouras, C.
1 more
Publication title:
Chemical vapor deposition XVI and EUROCVD 14 : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2003-8
Pub. Year:
2003
Page(from):
1364
Page(to):
1371
Pages:
8
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773782 [1566773784]
Language:
English
Call no.:
E23400/200308
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Polycrystalline Silicon Thin Film Transistors With Gate Oxides Deposited by LPCVD Using Tetraethylorthosilicate (TEOS)

Kouvatsos, D.N., Vamvakas, V.E., Davazoglou, D.

Electrochemical Society
7 Conference Proceedings Silicon (Oxy)Nitride Thin Films Deposited by LPCVD from SiCl2H2-NH3-N2O Mixtures of Variable Composition

Davazoglou, D., Iliadis, A. A.

MRS - Materials Research Society
2 Conference Proceedings Arrangement of Silicon and Oxygen Atoms in Low Pressure Chemically Vapor Deposited SiO2 Films by SiH4-02 and TEOS Chemistries: Comparison With Thermally Grown …

Vamvakas, V., Pappa, A., Davazoglou, D.

Electrochemical Society
8 Conference Proceedings Silicon nanocrystals in SiO2 for memory devices

Nassiopoulou, A. G., Ioannou-Sougleridis, V., Travlos, A.

Kluwer Academic Publishers
3 Conference Proceedings Optical Properties of Low Pressure Chemically Vapor Deposited Silicon Oxynitride Films From SiCl2H2-NH3-N2O Mixtures

Davazoglou, D.

Electrochemical Society
9 Conference Proceedings Optical Properties of Undoped, Phosphorous Doped and Oxidized LPCVD Polycrystalline Silicon Films Obtained by Transmission and FTIR Measurements

Davazoglou, D., Kouvatsos, D., Valamontes, E.

Electrochemical Society
4 Conference Proceedings Fabrication of Electrochromic Displays by Chemically Vapor Depositing Patterning WO3 Films on SnO2:F Covered Glass Substrates

Vassilopoulou, M., Pappas, D., Raptis, I., Davazoglou, D., Kostis, I.

Electrochemical Society
10 Conference Proceedings Chemical Vapor Deposition of SnO2 Films Within the Pores of Vycor Substrates for the Control of Their Porosity

Magoulianiti, E.A., Beltsios, K., Davazoglou, D., Romanos, G., Kanellopoulos, N.

Electrochemical Society
5 Conference Proceedings Thin film transistors fabricated in laser crystallized chemically vapor deposited amorphous silicon films on quartz substrates

Kouvatsos, D. N., Vbutsas, A. T., Papaioannou, G. J.

Electrochemical Society
11 Conference Proceedings The Properties of Low Pressure Chemical Vapor Deposited Boron Nitride Thin Films

Dana,S.S.

Trans Tech Publications
6 Conference Proceedings Chemically vapor deposited SnO2 films by oxidation of SnCl2 vapors: Films characterization and application in gas sensors

Favre, C., Vourdas, N., Pimients, E., Vamvakis, V. E., Davazoglou, D.

Electrochemical Society
12 Conference Proceedings Effect of Annealing Ambient on Performance and Reliability of Low Pressure Chemical Vapor Deposited Oxides for Thin-Film Transistors

Bhat, N., Wang, A., Saraswat, K. C.

MRS - Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12