Study of the Automatic Modeling of Reaction Systems for Chemical Vapor Deposition Processes Using Genetic Algorithms

Study of the Automatic Modeling of Reaction Systems for Chemical Vapor Deposition Processes Using Genetic Algorithms

Author(s):

Publication title:

Chemical vapor deposition XVI and EUROCVD 14 : proceedings of the international symposium

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

2003-8

Pub. Year:

2003

Page(from):

272

Page(to):

278

Pages:

7

Pub. info.:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566773782 [1566773784]

Language:

English

Call no.:

E23400/200308

Type:

Conference Proceedings

Details

TDL ID:	ZA00014071
Series ID:	PA00000028
Conf. info. (Name):	International Conference on Chemical Vapor Deposition ; EUROCVD ; Electrochemical Society Meeting
Conf. info. (Number):	16th ; 14th ; 203rd
Conf. info. (Venue):	Paris, France
Conf. info. (Date):	2003.04.27-2003.05.02

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