Simulation of Epitaxial Silicon Deposition and Dopant Incorporation in an Industrial Barrel Reactor
- Author(s):
Di Stanislao, M. Valente, G. Fascella, S. Masi, M. Cani, S. Fei, J.Y. Yarlagadda, S. - Publication title:
- Chemical vapor deposition XVI and EUROCVD 14 : proceedings of the international symposium
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 2003-8
- Pub. Year:
- 2003
- Page(from):
- 226
- Page(to):
- 234
- Pages:
- 9
- Pub. info.:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566773782 [1566773784]
- Language:
- English
- Call no.:
- E23400/200308
- Type:
- Conference Proceedings
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