Blank Cover Image

High Performance Strained-SOI CMOSFETs*

Author(s):
Takagi, S.-I.
Mizuno, T.
Tezuka, T.
Sugiyania, N.
Numata, T.
Usuda, K.
Moriyama, Y.
Nakaharai, S.
Koga, J.
Tanabe, A.
Macda, T.
6 more
Publication title:
ULSI Process Integration : proceedings of the International Symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2003-6
Pub. Year:
2003
Page(from):
518
Page(to):
533
Pages:
16
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773768 [1566773768]
Language:
English
Call no.:
E23400/200306
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings High performance strained-SOl CMOSFETs

Takagi, S-I., Mizuno, T., Tezuka, T., Sugiyama, N, Numata, T., Usuda, K., Monyama, Y., Nakaharai, S., Koga, J., Tanabe, …

Electrochemical Society
7 Conference Proceedings 38 Fabrication of SiGe-on-Insulator substrates for high-performance strained SOI-MOSFETs by germanium condensation technique

Fezuka, F., Suglyama, N., Mizuno, F, Nakaharai, S., Fakagi, S.

Electrochemical Society
2 Conference Proceedings (3.1) 3:20 - 3:50 PM - Strained-Si/SiGe-on-Insulator CMOS Technology as a Platform of Device Performance Boosters (Invited)

Takagi, S., Mizuno, T., Tezuka, T, Sugiyama, N., Numata, T., Usuda, K., Moriyama, Y., Nakaharai, S., Koga, J., Tanabe, …

Electrochemical Society
8 Conference Proceedings Mobility-Enhanced Device Technologies Using SiGe/Ge MOS Channels

S. Takagi, T. Irisawa, T. Tezuka, S. Nakaharai, T. Numata

Electrochemical Society
3 Conference Proceedings Uniaxially Strained SGOI and SSOI Channels for High Performance Multi-Gate CMOS

T. Irisawa, T. Numata, T. Tezuka, K. Usuda, N. Hirashita

Electrochemical Society
9 Conference Proceedings Prospects and Critical Issues on Ge MOS Technologies

S. Takagi, N. Taoka, S. Nakaharai, K. Ikeda, T. Tezuka

Electrochemical Society
4 Conference Proceedings Strain Relaxation of Strained-Si Layers on SiGe-on-Insulator (SGOI) Structures After Mesa Isolation

Usuda, Koji, Mizuno, Tomohisa, Tezuka, Tsutomu, Sugiyama, Naoharu, Moriyama, Yoshihiko, Nakaharai, Shu, Takagi, …

Materials Research Society
10 Conference Proceedings Study of the Surface Cleaning of GOI and SGOI Substrates for Ge Epitaxial Growth

Y. Moriyama, N. Hirashita, E. Toyoda, K. Usuda, S. Nakaharai

Electrochemical Society
5 Conference Proceedings (6.4) 11:55 - 12:15 PM - Ge Diffusion Effect on Low Frequency Noise in Ultra-thin Strained-SOI CMOS

Tanabe, A., Numata, T., Mizuno, T., Maeda, T., Takagi, S. (MIRAI)

Electrochemical Society
11 Conference Proceedings (11.2) 3:40 - 4:00 PM - Formation Mechanism of Ge-on-lnsulator Layers by Ge-condensation Technique

Nakaharai, S., Tezuka, T., Sugiyama, N., Takagi, S. (MIRAI ASET)

Electrochemical Society
6 Conference Proceedings SiGe-on-Insulator and Ge-on-Insulator Substrates Fabricated by Ge-Condensation Technique for High-Mobility Channel CMOS Devices

Tezuka, Tsutomu, Mizuno, Tomohisa, Sugiyama, Naoharu, Nakaharai, Shu, Moriyama, Yoshihiko, Usuda, Koji, Numata, …

Materials Research Society
12 Conference Proceedings Ge Condensation Technologies for Advanced MOSFETs on SGOI and GOI Substrates

N. Sugiyama, T. Tezuka, T. Irisawa, K. Usuda, Y. Moriyama

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12