Extending Planar Single-Gate CMOS & Accelerating the Realization of Double-Gate/Multi-Gate CMOS Devices*
- Author(s):
- Publication title:
- ULSI Process Integration : proceedings of the International Symposium
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 2003-6
- Pub. Year:
- 2003
- Page(from):
- 330
- Page(to):
- 348
- Pages:
- 19
- Pub. info.:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566773768 [1566773768]
- Language:
- English
- Call no.:
- E23400/200306
- Type:
- Conference Proceedings
Similar Items:
Electrochemical Society |
SPIE - The International Society for Optical Engineering |
Electrochemical Society |
8
Conference Proceedings
INFLUENCE OF MICRO-DEFECT MORPHOLOGY ON INTRINSIC GETTERING EFFECTIVENESS AND DURABILITY IN CMOS EPITAXIAL PROCESSING
Materials Research Society |
Materials Research Society |
Plenum Press |
4
Conference Proceedings
Improved Device Scaling & Process Simplification Through Advanced Ion Implantation Techniques*
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
SPIE-The International Society for Optical Engineering |
Electrochemical Society |