A study on selective Si0.8Ge0.2 etch using polysilicon etchant diluted by H20 for three-dimensional Si structure application
- Author(s):
- Publication title:
- Silicon-on-insulator technology and devices XI : proceedings of the international symposium
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 2003-5
- Pub. Year:
- 2003
- Page(from):
- 81
- Page(to):
- 86
- Pages:
- 6
- Pub. info.:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566773751 [156677375X]
- Language:
- English
- Call no.:
- E23400/200305
- Type:
- Conference Proceedings
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