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Thermally Driven Atomic Transport in Silicon Oxynitride and High-k Films on Silicon

Author(s):
Baumvol, I.J.R.
Stedile, F.C.
Morais, J.
Krug, C.
Radtke, C.
da, Rosa
E.B.O
Bastos, K.P.
Pezzi, R.P.
Miotti, L.
Soares, G.V.
6 more
Publication title:
Silicon nitride and silicon dioxide thin insulating films VII : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2003-2
Pub. Year:
2003
Page(from):
106
Page(to):
118
Pages:
13
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773478 [1566773474]
Language:
English
Call no.:
E23400/200302
Type:
Conference Proceedings

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