Fluorocarbon Films Vapor Deposited in the Absence of a Plasma

Fluorocarbon Films Vapor Deposited in the Absence of a Plasma

Author(s):: Gleason, K. ( MIT, Cambridge, MA )
Publication title:: Proceedings from the ninth Meeting of the Symposium on Polymers for Microelectronics at Winterthur, May 1st, 2nd, & 3rd, 2000
Title of ser.:: Electrochemical Society Proceedings Series
Ser. no.:: 2000-37
Pub. Year:: 2000
Page(from):: 484
Page(to):: 506
Pages:: 23
Pub. info.:: [S.l.]: Electrochemical Society
ISSN:: 01616374
Language:: English
Call no.:: E23400/200037
Type:: Conference Proceedings

Details

TDL ID:	ZA00014060
Series ID:	PA00000028
Conf. info. (Name):	Meeting of the Symposium on Polymers for Microelectronics at Winterthur
Conf. info. (Number):	9th
Conf. info. (Venue):	Wilmington, DE, USA
Conf. info. (Date):	2000.05.01-2000.05.03

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