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The Effects of Oxygen Concentration in Ni Film on the Metal Induced Crystallization of a-Si:H

Author(s):
Publication title:
Thin Film Transistor Technologies VI : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2002-23
Pub. Year:
2002
Page(from):
140
Page(to):
145
Pages:
6
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773850 [1566773857]
Language:
English
Call no.:
E23400/200223
Type:
Conference Proceedings

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