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Etching of High-k Gate Dielectrics and Gate Metal Candidates

Author(s):
Han, S.K
Kim, I.
Zhong, H
Heuss, G.P.
Lee, J.H
Wicairsana, D.
Maria, J.P.
Misra, V.
Osburn, C.M.
4 more
Publication title:
Plasma processing XIV : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2002-17
Pub. Year:
2002
Page(from):
199
Page(to):
209
Pages:
11
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773416 [1566773415]
Language:
English
Call no.:
E23400/200217
Type:
Conference Proceedings

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