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Surface Treatment of SiC using NF3/O2 Plasmas

Author(s):
Kai, T.J
Shimizu, W.
Hibi, A.
Iwase, T.
Abe, T.
Inaba, M.
Ogumi, Z.
Tojo, T.
Tasaka, A.
4 more
Publication title:
Plasma processing XIV : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2002-17
Pub. Year:
2002
Page(from):
84
Page(to):
91
Pages:
8
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773416 [1566773415]
Language:
English
Call no.:
E23400/200217
Type:
Conference Proceedings

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