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Post Oxide Etching Cleaning Process Using Integrated Ashing and HF Vapor Process

Author(s):
  • Kwon, O. ( (Massachusetts Institute of Technology) )
  • Sawin, H. ( (Massachusetts Institute of Technology) )
Publication title:
Environmental issues with materials and processes for the electronics and semiconductor industries V : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2002-15
Pub. Year:
2002
Page(from):
166
Page(to):
179
Pages:
14
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773379 [1566773377]
Language:
English
Call no.:
E23400/200215
Type:
Conference Proceedings

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