Blank Cover Image

Potential Cost of Ownership Reduction for a Nitride Furnace Point of Use Abatement Device

Author(s):
Publication title:
Environmental issues with materials and processes for the electronics and semiconductor industries V : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2002-15
Pub. Year:
2002
Page(from):
77
Page(to):
86
Pages:
10
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773379 [1566773377]
Language:
English
Call no.:
E23400/200215
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Point of Use Abatement Unit By-Pass for NF3-Based CVD Chamber Clean Applications

Babbitt, D., Mendicino, L., Vartanian, V., Goolsby, B., Brown, P.T.

Electrochemical Society
7 Conference Proceedings Long-Term Evaluation of a Litmas 'Blue' Inductively-Coupled Plasma Device for Point-of-Use PFC and HFC Abatement

Vartanian, V., Beu, L., Stephens, T., Jewett, R., Tonnis, E., Graves, D.

Electrochemical Society
2 Conference Proceedings Emissions Characterization of Advanced CVD Processes and Abatement Performance

Vartanian, V., Goolsby, B., Reddy, C., Arunachalam, V., Mendicino, L.

Electrochemical Society
8 Conference Proceedings Characterization and Abatement of Emissions from Advanced CVD Processes

Mendicino, L., Vartanian, V., Gonlsby, B., Brown, P.T., Reid, K., Van Gompel, J.

Electrochemical Society
3 Conference Proceedings Point of Use Abatement for CVD Precursors and Reaction Products

Mendicino, L., Brown, P., Vartanian, V., Reid, K., Van Gompel, J.

Electrochemical Society
9 Conference Proceedings Fate of Fluorine Emissions from NF3-Based CVD Chamber Cleaning Process

Vartanian, V., Goolsby, B., Mendicino, L., Brown, PT., Vires, J., Raley, D. Babbittand B.

Electrochemical Society
4 Conference Proceedings Analysis of Implanter Source-Region Exhaust by FTIR

Goolsby, B., Vartanian, V., Rendon, M., Wagner, M., Mendicino, L.

Electrochemical Society
10 Conference Proceedings Characterization of Plasma-Etched RuO2 Substrates

Vartanian, V., Goolsby, B., Samavedam, S., Mendicino, L, Lee, J.J., Guenther, T., Dakshina-Murthy, S., Sparks, C.

Electrochemical Society
5 Conference Proceedings The Evaluation of Hexafluoro-1,3-Butadiene as an Environmentally Benign Dielectric Etch Chemistry in a Medium Density Etch Chamber

Chatterjee, R., Reif, R., Sparks, I., Vartanian, V., Goolsby, B., Mendicino, L.

Electrochemical Society
11 Conference Proceedings Cost of ownership reduction for OPC development and production

Yuan, C.-M., Jarvis, B., Lucas, K.D., Boone, R., Tian, R., Reich, A.

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Characterization of NF3 Chamber Cleans on Multiple CVD Platforms

Goolsby, B., Vartanian, V., Mendicino, L., Rivers, J., Vires, J., Soyemi, A., Sun, S.P., Turner, M., Esber, C.

Electrochemical Society
12 Conference Proceedings Litmas Plasma Abatement Long-Term Reliability Test

Vartanian, V., Beu, L., Stephens, T., Rivers, J., Perez, B., Kiehlbauch, M., Tonnisand, E., Graves, D.

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12