Characterization of Plasma-Etched RuO2 Substrates

Characterization of Plasma-Etched RuO2 Substrates

Author(s):

Vartanian, V. ( (Motorola), )

Goolsby, B. ( (Motorola), )

Samavedam, S. ( (Motorola), )

Mendicino, L ( (Motorola), )

Lee, J.J. ( (Motorola), )

Guenther, T. ( (Motorola), )

Dakshina-Murthy, S. ( (Advanced Micro Devices) )

Sparks, C. ( (International SEMATECH) )

3 more

Publication title:

Environmental issues with materials and processes for the electronics and semiconductor industries V : proceedings of the international symposium

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

2002-15

Pub. Year:

2002

Page(from):

51

Page(to):

62

Pages:

12

Pub. info.:

Pennington, N.J.: Electrochemical Society

ISSN:

01616374

ISBN:

9781566773379 [1566773377]

Language:

English

Call no.:

E23400/200215

Type:

Conference Proceedings

Details

TDL ID:	ZA00014049
Series ID:	PA00000028
Conf. info. (Name):	Symposium on Environmental Issues with Materials and Processes in the Electronics and Semiconductor Industries ; Meeting of the Electrochemical Society
Conf. info. (Number):	5th ; 201st
Conf. info. (Venue):	Philadelphia, PA, USA
Conf. info. (Date):	2002.05.00

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