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Process Optimization in Atomic Layer Deposition of High-K Oxides for Advanced Gate Stack Engineering

Author(s):
Londergan, A.R.
Ramanathan, S.
Vu, K.
Rassiga, S.
Hiznay, R.
Winkler, J.
Velasco, H.
Matthysse, L.
Seidel, T.E.
Ang, C.H.
Yu, H.Y.
Li, M.F.
7 more
Publication title:
Rapid thermal and other short-time processing technologies III : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2002-11
Pub. Year:
2002
Page(from):
163
Page(to):
176
Pages:
14
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773348 [1566773342]
Language:
English
Call no.:
E23400/200211
Type:
Conference Proceedings

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