Blank Cover Image

Electron Cyclotron Resonance Plasma Enhanced Chemical Vapour Depo- sition (ECR-PECVD): A Versatile Tool in the Fabrication of Optoelectronic Devices

Author(s):
Publication title:
Integrated optoelectronics : proceedings of the first international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2002-4
Pub. Year:
2002
Page(from):
3
Page(to):
22
Pages:
20
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773706 [1566773709]
Language:
English
Call no.:
E23400/2002-4
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Optical and Compositional Analysis of Annealed SiOx Thin Films Deposited by Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition

T. Roschuk, J. Wojcik, R Mascher

Society of Vacuum Coaters
7 Conference Proceedings Wet Etching Studies on Electron Cyclotron Resonance (ECR) Plasma Enhanced Chemical Vapor Deposited Silicon Nitride Films

Sundaram, K.B., Sah, R.E., Balachandran, K.

Electrochemical Society
2 Conference Proceedings The Influence of the Deposition Conditions on the Optical and Compositional Characteristics of SiOx Thin Films Deposited by ECR-PECVD

J. Wojcik, P. Mascher

Society of Vacuum Coaters
8 Conference Proceedings Erbium doped silicon rich silicon oxide luminescent thin films deposited by ECR-PECVD [5970-118]

Blakie, D., Zalloum, O.H.Y., Wojcik, J., Irving, E.J., Knights, A.P., Mascher, P.

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Oxide Film Formation From Electron Cyclotron Resonance (ECR) Plasmas

Barbour, J.C., Apblett, C.A., Denison, D.R., Sullivan, J.P.

Electrochemical Society
9 Conference Proceedings Silicon nitride deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposititon for micromachining applications

Panepucci,R.R., Diniz,J.A., Carli,E., Tatschi,P.J., Swart,J.W.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Characterization of Silicon Oxynitride Thin Films Deposited By ECR-PECVD

Simionescu, C., Wojcik, J., Haugen, H.K., Davies, J.A., Mascher, P.

Electrochemical Society
10 Conference Proceedings Comparison of SiOxNy Thin Films Deposited by ECR-PECVD at 2.4 and 3.0 mTorr Total Pressure

J. Wojcik, L. Chan, W.N. Lennard, J.A. Davies, P. Mascher

Society of Vacuum Coaters
5 Conference Proceedings Influence of the Microwave Power in an ECR-PECVD Reactor on Dielectric-Cap Induced Blue Shifi in 1.55 μm Laser Structures

Wojcik, J., Robinson, B., Thompson, D.A., Mascher, P.

Electrochemical Society
11 Conference Proceedings ELECTRICAL AND CHEMICAL CHARACTERIZATION OF Si02 DEPOSITED BY ELECTRON CYCLOTRON RESONANCE - PECVD

Andosca, R.G., Varhue, W.J., Titcomb, S.

Materials Research Society
6 Conference Proceedings Electron cyclotron resonance CVD of silicon oxynitride for optoelectronic applications

Boudreau, M., Boumerzoug, M., Kruzelecky, R. V., Mascher, P., Jessop, P. E., Thompson, D. A.

MRS - Materials Research Society
12 Conference Proceedings ELECTRON CYCLOTRON RESONANCE PLASMA ETCHING/CLEANING FOR Si DEVICE FABRICATION

Wan, Zhimin, Yasuda, Tetsuji, Lucovsky, Gerald, Lamb, H. Henry

MRS - Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12