Organic contamination: impact, characterization, sources and cleaning during IC manufacturing

Organic contamination: impact, characterization, sources and cleaning during IC manufacturing

Author(s):

Publication title:

Crystalline defects and contamination: their impact and control in device manufacturing III : DECON 2001 : proceedings of the Satellite Symposium to ESSDERC 2001, Nuremberg, Germany

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

2001-29

Pub. Year:

2001

Page(from):

320

Page(to):

335

Pages:

16

Pub. info.:

Pennington, N.J.: Electrochemical Society

ISSN:

01616374

ISBN:

9781566773638 [1566773636]

Language:

English

Call no.:

E23400/200129

Type:

Conference Proceedings

Details

TDL ID:	ZA00014033
Series ID:	PA00000028
Conf. info. (Name):	Symposium on Crystalline Defects and Contamination - DECON ; European Solid State Device Research Conference - ESSDERC
Conf. info. (Number):	3rd (2001) ; 31st (2001)
Conf. info. (Venue):	Nuremberg, Germany
Conf. info. (Date):	2001.09.11-2001.09.13

Similar Items:

1 Conference Proceedings THE REMOVAL OF ORGANIC CONTAMINATION BY 03/DI-WATER PROCESSES: A THEORETICAL STUDY De Smedt, F., Vankerckhoven, H., Vinckier, C., De Gendt, S., Claes, M., Heyns., M. Electrochemical Society	7 Conference Proceedings Organic Contamination of Silicon Wafer in Clean Room Air and Its Impact to Gate Oxide Integrity Imafuku, D., Mizubayashi, W., Miyazaki, S., Hirose, M., Wakayama, Y., Kobayashi, S. MRS - Materials Research Society
2 Conference Proceedings MANAGEMENT OF METALLIC CONTAMINATION IN ADVANCED IC MANUFACTURING A. Danel, D. Renaud, P. Besson, C. Bigot, A. Groujilet, J. P. Joly, M. Claes, T. Bearda, J. Frickinger Electrochemical Society	8 Conference Proceedings Organic Contamination of Silicon Wafer in Clean Room Air and Its Impact to Gate Oxide Integrity Imafuku, D., Mizubayashi, W., Miyazaki, S., Hirose, M., Wakayama, Y., Kobayashi, S. MRS - Materials Research Society
3 Conference Proceedings EVALUATION OF OZONATED WATER SPRAY FOR RESIST CLEANING APPLICATIONS De Gendt, S., Lux, M., Claes, M., Van Hoeymissen, J., Conrad, T., Worth, W., Lagrange, S., Bergman, E., Jassal, A.S., … Electrochemical Society	9 Conference Proceedings Dissemination of Metallic Contamination During IC Manufacturing A. Danel, Y. Borde, A. Maurel, B. Laetitia, A. Royer Electrochemical Society
4 Conference Proceedings EFFICIENCY OF OZONATED DI WATER IN REMOVING ORGANIC CONTAMINATION Kenens, C., De Gendt, S., Knotter, D.M., Loewenstein, L.M., Meuris, M., Vandervorst, W., Heyns, M.M. Electrochemical Society	10 Conference Proceedings APPLICATION OF MOIST OZONE GAS PHASE FOR REMOVAL OF RESIST AND ORGANIC CONTAMINATION IN A NOVEL TANK TYPE PROCESSOR Wolke, K., Riedel, T., Haug, R., De Gendt, S., Heyns, M.M., Meuris, M. Electrochemical Society
5 Conference Proceedings Effect of Metal Contamination and Improved Cleaning Strategies Mertens, P.W., Bearda, T., Lowewenstein, L.M., Martin, A.R., Hub, W., Kolbesen, B.O., Teerlink, I., Vos, R., Baeyens, … Electrochemical Society	11 Conference Proceedings INTEGRATION OF HIGH-k GATE DIELECTRICS - WET ETCH CLEANING AND SURFACE CONDITIONING De Gendt, S., Beckx, S., Caymax, M., Claes, M., Conard, T., Delabie, A., Deweerd, W., Hellin, D., Kraus, H., Onsia, B., … Electrochemical Society
6 Conference Proceedings OZONATED HF APPLICATIONS IN A SPRAY PROCESSING Claes, M., Rohr, E., De Gendt, S., Lagrange, S., Bergman, E., Heyns, M. Electrochemical Society	12 Conference Proceedings REMOVAL OF PHOTORESIST BY 03 DI-WATER PROCESSES: DETERMINATION OF DEGRADATION PRODUCTS Vankerckhoven, H., De Smedt, F., Vinckier, C., Van Herp, B., Claes, M., De Gendt, S., Heyns, M. Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12