EFFECT OF COMPOSITION AND POST-DEPOSITION ANNEALING ON THE ETCH RATE OF HAFNIUM AND ZIRCONIUM SILICATES IN DILUTE HF
- Author(s):
- Publication title:
- Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 2001-26
- Pub. Year:
- 2001
- Page(from):
- 359
- Page(to):
- 366
- Pages:
- 8
- Pub. info.:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566773591 [1566773598]
- Language:
- English
- Call no.:
- E23400/200126
- Type:
- Conference Proceedings
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