REDUCTION OF SURFACE METALLIC CONTAMINATION THROUGH OPTIMIZED RINSING AND SINGLE-WAFER DRYING
- Author(s):
Fyen, W. Holsteyns, F. Lauerhaas, J. Bearda, T. Mertens, P. Heyns, M. - Publication title:
- Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 2001-26
- Pub. Year:
- 2001
- Page(from):
- 91
- Page(to):
- 101
- Pages:
- 11
- Pub. info.:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566773591 [1566773598]
- Language:
- English
- Call no.:
- E23400/200126
- Type:
- Conference Proceedings
Similar Items:
Electrochemical Society |
7
Conference Proceedings
MODELLING OF CRYSTAL ORIGINATED PARTICLES AND THEIR IMPACT ON GATE OXIDE INTEGRITY
Electrochemical Society |
2
Conference Proceedings
The use of unpatterned wafer inspection for immersion lithography defectivity studies [6152-68]
SPIE - The International Society of Optical Engineering |
8
Conference Proceedings
EFFECTIVE POST-ETCH RESIDUE REMOVAL ON LOW-K FILMS USING SINGLE WAFER PROCESSING
Electrochemical Society |
Electrochemical Society |
9
Conference Proceedings
EVALUATION OF MEGASONIC CLEANING SYSTEMS FOR PARTICLE REMOVAL EFFICIENCY AND DAMAGING
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
6
Conference Proceedings
MODELLING OF CRYSTAL ORIGINATED PARTICLES AND THEIR IMPACT ON GATE OXIDE INTEGRITY
Electrochemical Society |
12
Conference Proceedings
SUB 1OOnm PARTICLE REMOVAL WITH DEIONIZED WATER AND A MEGASONIC FREQUENCY OF 835kHz
Electrochemical Society |