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Study on Etching Mechanism of Al2O3 as a Stopper Layer for Self-Aligned Contact in a High Density Plasma Tool

Author(s):
Park, W.J.
Hong, J.
Jeon, J.S.
Min, G.J.
Chi, K.K.
Moon, J.T.
1 more
Publication title:
Semiconductor technology (ISTC 2001) : proceedings of the 1st International Conference on Semiconductor Technology
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2001-17
Pub. Year:
2001
Page(from):
428
Page(to):
435
Pages:
8
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773508 [1566773504]
Language:
English
Call no.:
E23400/200117
Type:
Conference Proceedings

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