Activation Methods For Electroless Copper Deposition Of Seeding Layer For ULSI Copper Interconnect Metallization
- Author(s):
- Publication title:
- Semiconductor technology (ISTC 2001) : proceedings of the 1st International Conference on Semiconductor Technology
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 2001-17
- Pub. Year:
- 2001
- Page(from):
- 45
- Page(to):
- 54
- Pages:
- 10
- Pub. info.:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566773508 [1566773504]
- Language:
- English
- Call no.:
- E23400/200117
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Comparative Study Of Cu Seeding Layer By CVD And Electroless Deposition Methods For VLSI CU Interconnect
Electrochemical Society |
Trans Tech Publications |
MRS - Materials Research Society |
Materials Research Society |
Materials Research Society |
Materials Research Society |
Electrochemical Society |
Electrochemical Society |
5
Conference Proceedings
The Proposal of All-Wet Fabrication Process for ULSI Interconnects Technologies - Application of Electroless NiB Deposition to Capping and Barrier Layers
Electrochemical Society |
11
Conference Proceedings
Coopper Oxide Removal By In-situ Plasma Pre-Treatment For Improved Copper To Dielectric Barrier Adhesion
Electrochemical Society |
6
Conference Proceedings
Characterization and reduction of copper chemical-mechanical-polishing-induced scratches
SPIE-The International Society for Optical Engineering |
Materials Research Society |