Blank Cover Image

Comparison of Tungsten Bit Line Mask Scheme for the Next Generation 4Giga DRAM

Author(s):
Publication title:
Semiconductor technology (ISTC 2001) : proceedings of the 1st International Conference on Semiconductor Technology
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2001-17
Pub. Year:
2001
Page(from):
507
Page(to):
515
Pages:
9
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773508 [1566773504]
Language:
English
Call no.:
E23400/200117
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Study on Etching Mechanism of Al2O3 as a Stopper Layer for Self-Aligned Contact in a High Density Plasma Tool

Park, W.J., Hong, J., Jeon, J.S., Min, G.J., Chi, K.K., Moon, J.T.

Electrochemical Society
7 Conference Proceedings Fabrication of membrane mask for next-generation lithography

Kim,D., Lera,J.D., Cho,H., Moon,J.

SPIE - The International Society for Optical Engineering
2 Conference Proceedings Cell projection EB exposure for Giga DRAM device mask

Shin, J.C., Lim, M., Lee, Y., Choi, B.-K., Choi, Y., Han, O.

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Next-generation mask metrology tool

Schlueter, G., Roeth, K.-D., Blaesing-Bangert, C., Ferber, M.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings INVITED: INTEGRATED PROCESSING OF MEGA - AND GIGA-BIT DRAMs

Alsmeier, J., Bronner, G.

Electrochemical Society
9 Conference Proceedings Impact of mask defect in a high MEEF process

Jeong, C.-Y., Park, K.-Y., Choi, J.S., Lee, J.G., Lee, D.-H.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Plasma etch of Cr masks utilizing TCP source for a next-generation plasma source

Kwon, H.-J., Min, D.-S., Jang, P.-J., Chang, B.-S., Choi, B.-Y., Jeong, S.-H.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings First performance data obtained on next-generation mask metrology tool

Schlueter,G., Roeth,K.-D., Whittey,J.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Aberration sensitivity control for the isolation layer in low-k1 DRAM process

Cho, B.-H., Yim, D., Park, C.-H., Lee, S.-H., Yang, H.-J., Choi, J.-H., Shin, Y.-C., Kim, C.-D., Choi, J.-S., Kang, …

SPIE-The International Society for Optical Engineering
11 Conference Proceedings CD control at low K1 optical lithography in DRAM device

Hong, J., Woo, C., Park, J., Cho, B., Choi, J.-S., Yang, H., Park, C., Shin, Y.-C., Kim, Y., Jeong, G., Kim, J., Kang, …

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Capacitor Technology for GIGA Scale DRAM*

Roh, Jae-Sung, Hong, Kwon, Choi, Hyung-Bok, Yoon, Dong-Soo, Ch, Ho-Jin, Yoon, Hee-Koo, Park, Young-June

Electrochemical Society
12 Conference Proceedings Integration using inorganic BARC in a via-first dual-damascene process with low-k dielectric

Ahn, J.K., Choi, S.H., Kim, Y.K., Park, K.Y., Choi, J.S., Hong, E.S., Shin, K.S., Kim, S.B., Choi, K.K., Hwang, S.B., …

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12