InN Whisker Growth by Chemical Vapor Deposition

InN Whisker Growth by Chemical Vapor Deposition

Author(s):

Publication title:

Fundamental gas-phase and surface chemistry of vapor-phase deposition II and process control, diagnostics, and modeling in semiconductor manufacturing IV : proceedings of the international symposium

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

2001-13

Pub. Year:

2001

Page(from):

356

Page(to):

364

Pages:

9

Pub. info.:

Pennington, N.J.: Electrochemical Society

ISSN:

01616374

ISBN:

9781566773195 [1566773199]

Language:

English

Call no.:

E23400/200113

Type:

Conference Proceedings

Details

TDL ID:	ZA00014016
Series ID:	PA00000028
Conf. info. (Name):	Fundamental Gas-Phase and Surface Chemistry of Vaper-Phase Materials Synthesis ; Symposium on Process Control, Diagnostics and Modeling in Semiconductor Manufacturing
Conf. info. (Number):	2nd ; 4th
Conf. info. (Venue):	Washington, D.C., USA
Conf. info. (Date):	2001.00.00

Similar Items:

1 Conference Proceedings Nanosized GaN Particles by Chemical Vapor Infiltration Parala, H., Devi, A., Birkner, A., Fischer, R.A. Electrochemical Society	7 Conference Proceedings *Growth of (Ni, Zn)Fe3O4 thin films by liquid delivery metal-organic chemical vapor deposition Gangaware, D., Woolcott, R., Kingon, A. I., Roeder, J. F., Baum, T. H. MRS-Materials Research Society
2 Conference Proceedings Low Temperature Chemical Vapor Deposition of Group-III-Nitrides Fischer, R.A., Rogge, W. Electrochemical Society	8 Conference Proceedings Epitaxial Growth of 4H-SiC on (000-1) C-Face Substrates by Cold-Wall and Hot-Wall Chemical Vapor Deposition R.A. Stein, B. Thomas, C. Hecht Trans Tech Publications
3 Conference Proceedings Nano structures of Group-III Nitrides by MOCVD Using Molecular Precursors Khanderi, J., Wohifart, A., Parala, H., Devi, A., Fischer, R.A. Electrochemical Society	9 Conference Proceedings HETEROEPITAXIAL NUCLEATION AND GROWTH OF Ge ON Si (100) SURFACES USING REMOTE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION Rudder, R.A., Hattangady, S.V., Vitkavage, D.J., Markunas, R.J. Materials Research Society
4 Conference Proceedings Substrate Effects on the Growth of InN Donovan, S. M., MacKenzie, J. D., Abernathy, C. R., Pearton, S. J., Holloway, P. H., Ren, F., Zavada, J. M., Chai, B. MRS - Materials Research Society	10 Conference Proceedings Growth of Compound Semiconductors and Superlattices by Organometallic Chemical Vapor Deposition: Transport Phenomena Jensen, Klavs F., Fotiadis, Dimitrios I., McKenna, Donald R., Moffat, Harry K. American Chemical Society
5 Conference Proceedings Growth Kinetics and Mechanistic Studies of GaN Thin Films Grown by OMVPE Using (N3)2Ga[(CH2)3NMe2] as Single Source Precursor Wohlforr, A., Devi, A., Rogge, W., Fischer, R.A., Schaefer, J., Wolfrum, J., Allendorf, M.D. Electrochemical Society	11 Conference Proceedings In Situ SiC Feeding by Chemical Vapor Deposition for Bulk Growth Charpentier, L., Baillet, F., Chaussende, D., Auvray, L., Pons, M., Pernot, E., Madar, R. Trans Tech Publications
6 Conference Proceedings Growth kinetics of GaN thin films grown by OMVPE using single source precursors Fischer, R. A., Wohlfart, A., Devi, A., Rogge, W. MRS-Materials Research Society	12 Conference Proceedings MOCVD of TiO2 thin films on OTS modified Si(100) substrates by microcontact printing: Selective growth and new characterization technique with micro-raman … Kong, B.-C., Lee, J.-H., Jung, D.-Y., Devi, A., Bhakta, R., Fischer, R. A., Boo, J.-H. Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12